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TALON PV will cater to third-party, non-integrated domestic module assemblers.

Wafer 120 – 140um

Silver (Ag) paste

LECO

Tandem & Perovskite  tooling spacing in line

Custom contact  10/16/18+  busbar

Tested in modules proven  stable UVID and “Light  and  elevated temperature  induced degradation” (LeTID) effects

Tested by Fraunhofer ISE  

TALON PV Advantages

Intellectual Property Risk Analysis

LECO Laser-Enhanced Contact Optimization

Intellectual Property Risk Analysis

  

TALON PV conducted deep dive TOPCon IP analysis in partnership with Fraunhofer, RCT and third-party patent lawyers. Understanding IP is the best defense against infringement. 

PVD Deposition

LECO Laser-Enhanced Contact Optimization

Intellectual Property Risk Analysis


TALON PV’s proprietary front and back PVD deposition process creates many advantages including A) more uniform and efficient layering B) eliminates the use of Silane (SiH4) and Phosphine (PH3), providing substantial benefits for environmental safety and permitting requirements.

PVD vs LPCVD = Lower current 

leakage, less wrap-around, 

fewer dark edges.

LECO Laser-Enhanced Contact Optimization

LECO Laser-Enhanced Contact Optimization

LECO Laser-Enhanced Contact Optimization

  

TALON PV is incorporating LECO into our current equipment adding a 0.50-0.75% efficiency increase.

Better contact between the metallic grid and the silicon surface, reducing shading losses typically caused by wide metallization lines.

Precise ablation reduces waste, optimizing material usage in production.

Current configuration offerings

M10 Standard Cell

M10 Standard Cell

M10 Standard Cell

  182mm x 182mm

>25% efficiency



Alt: 182mm x 183.75mm

G12 Standard Cell

M10 Standard Cell

M10 Standard Cell

  210mm x 210mm

>25% efficiency



Alt: G12R: 210mm x 182mm


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